Differentiable Computational Lithogrpahy Framework
Large-Area Fabrication-Aware Computational Diffractive Optics (SIGGRAPH Asia & TOG 2025)
Open-source computational lithography workflow, manufacturability benchmarking, and foundation model data engine for advanced EUV/curvilinear mask processes
repo for the website of neural litho project
Physics-accurate EUV lithography simulator — LPP Sn-plasma source, CXRO materials, multilayer TMM optics, RCWA 1D/2D mask3D, Abbe/Hopkins aerial imaging with partial coherence, resist chain (Dill ABC, PEB, development, shot noise), process window (Bossung, DoF/EL), resist calibration from wafer data. Apache-2.0, 534 tests, 6 verified notebooks.
GPU-accelerated cloud platform for OPC / inverse lithography (ILT) with native curvilinear mask support — GDS/OASIS in, corrected masks out.
广东工业大学2025届本科毕业设计创新奖作品。This repository presents a 2025 undergraduate thesis from Guangdong University of Technology (Automation). It proposes a GNN-based lithography hotspot detection algorithm for IC layouts, received the Outstanding Innovation Award.
Research-grade simulator for 0.55 NA High-NA EUV lithography. Models the path from 13.5 nm source through anamorphic optics to wafer aerial image, with Mask 3D effects, photoresist, and SMO/PMWO optimization.
Per-pixel binary discrete flow matching with trajectory-attached fine-tuning for inverse lithography (OPC)
Rigorous 3D electromagnetic near-field simulation for lithography masks: frequency-domain vector FEM on conformal tetrahedra, with GPU assembly and a GPU sparse direct solver
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